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AlN Template on SapphireAllN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. Specifications • Sizes 4” Round • Dimensions: 100 mm +/- 2mm • Substrate Sapphire Orientation: c-axis (00.1) +/- 0.3deg. • Type and Doping: Undoped, Semi-insulating • Macro Defect Density: <=5 cm-2 • Front Surface Finish (Al Face): As-grown • Back Surface Finish Sapphire as-received finish • Useable Surface Area >90% • Edge Exclusion Area 1mm • Package Single Wafer Container • AlN layer thickness 1000 nm , (¡À 10%) For Surface Rughness and XRD data, Please click here.
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