MTI KOREA Battery
Battery R & D
- Battery R&D Equipment
- Battery Performance Analysis
- Battery Materials
- Battery Safety Test Equipment
- Furnaces for Battery Materials Synthesis
- Solar & Fuel Cells R&D
- Thermoelectric Materials
Crystal & Material
Crystals Substrates : A-Z
Ceramic Substrates : A-Z
Thin Film on Substrates : A-Z
Metallic substrate :A to Z
Nano Powder&Chemical
Target / Evaporation : A-Z
Thermal Processing
Smart Furnaces
- Muffle Furnaces (400-1800°C)
- Crystal Growth System
- Tube Furnaces (1- 7 Zones)
- Dental Sintering Furnaces
- CVD Furnace System
- Dry Ovens / Hot Plates
- Hi-Pressure Furnaces
- Induction Heater & Melter
- RTP Furnaces
- Hydrothermal Reactor
Furnace Accessories
Plasma System
Plasma Sputtering & Cleaning
PECVD
Microspheres-Nanospheres
Inorganic
Organic
Magnetic
Radioactive
Size Standards
Sample Preparation & Analysis
Cutting / Dicing Saws
Polishing Machines
Lab Press & Rollers
Power & Slurry Mill / Mixer
Film Coating
Desktop Machine-shop
Material Analysis
TGA Analysis
Battery / Capacitor Analyzers
Desk-Top X-Ray Instruments
Digital Microscopes
Other Lab Equipment
Glove Box & Fume Hood
Digital Lab Balances
Plasma/UV-Zone Cleaners
Ultrasonics/Water Circulator
UV Equipment & Adhesives
Lab Ware / Accessory
Sample Handling
Gel Sticky Boxes
Membrane Film Boxes
Round Wafer Carriers
IC Tray & Plastic Boxes
Vacuum Pen & Tweezers
Knowledge Center
Metal sputtering target
Alloy sputter coating target
Oxide ceramic target
Boride ceramic sputtering target
Carbide ceramic sputtering target
Nitride ceramic sputtering Targets
Selenide ceramic sputtering targets
Silicide ceramic sputtering targets
Sulfide ceramic sputtering targets
Sputtering Target Bonding
