AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.
AlN template is a cost effective way to replace AlN single crystal substrate.
Specifications
• Sizes 10mmx10mm
- • Substrate Sapphire Orientation: c axis (0001) +/- 1.0 deg.
- • Type and Doping for the AlN film: Undoped, Semi-insulating
• Macro Defect Density: <5 cm-2
• Front Surface Finish (Al Face): As-grown
• Back Surface Finish Sapphire as-received finish
• Useable Surface Area >90%
• Edge Exclusion Area 1mm
• Package Single Wafer Container
• AlN layer thickness 5000 nm +/- 5%
Related data
For Surface Rughness and XRD data, Please click here.
