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1200°C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD

1200°C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD

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Product Name 1200°C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD
Sale Price Call for Price
Product Code OTF1200XSHPCVD
Quantity 수량증가수량감소
상품 옵션
 
OTF-1200X-S-HPCVD is a compact 2" split tube furnace with internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller.  It is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth ( HDC) under various atmosphere for new generation crystal research.


SPECIFICATIONS:



Split Tube Furnace



  •      •  208 - 240 VAC, 50/60Hz,  1.2 KW max. power consumption
  •      •  Working temperature:  1100°C continuous and 1200°C Max.
  •      •  2" quartz tube (50mm O.D x 44mm I.D x 450mm L)  with vacuum sealed flanges.
  •      •  Optioanl:  you may choose dual zone tube furnace at Pic below right at extra cost to creat higher
            thermal gradient or longer constant temperature zone

            1          -- two zone furnace      


Temperature Control




  •      •  PID automatic control via solid state relay with 30 steps programmable
  •      •  Built in Over Temperature and Thermocouple Failure Protection
  •      •  +/-1°C accuracy
  •      •  K-type thermal couple
  •      •  Heating zone  length:  200mm  ( 8")
  •      •  Constant temperature zone: 60 mm   (+/-1°C @ 1000 °C )
                  


Vacuum Sealing
  
 

  •      •  2" quick clamp flange with 1/4''  fittings, vacuum gauge as well as needle valve on the right side
  •      •  The right flange is connected to a stainless steel bellow which is stretchable up to 150 mm.
  •      •  Left flange with quick-clamped KF25 vacuum port and 1/4'' barb venting valve
  •      •  Max. Vacuum level:  10E-2 torr by mechanical pump and 10-E5 by turbopump

             (click picture  to see details )  


Internal Traveling Mechanism
                     &

PLC Control Pannel

  •      •  One 1/4" Dia. x 24'' long K-type thermal couple is inserted through the right flange to support a
            mini-crucible boat in the chamber. (click pic.1 to view)
  •      •  A step motor can drive the crucible inside the tube from the heating center to the right end of the
            furnace,
    100 mm max.
  •      •  Touch screen control panel allows travel distance setting and temperature display of crucible
             position (click pic.2 to view)
  •      •  Traveling speed is constant at 180mm/ min. ( variable speed control is available upon request at
             additional cost )
  •      •  A 50x20x20mm mini-crucible boat (~20ml) is installed on a thermal couple (click pic.3 to view).
  •      •  AIN Sample Holder or Graphite Flat Substrate Holder for the wafer is available upon request,
             additional customization fee will apply (click pic.4 to view).

                          
            Pic.1                      Pic.2                        Pic.3                         Pic.4                                      Pic.5


Max. Heating & Cooling Rate



The max heating and cooling rate can be achieved by moving sample into pre-heated hot zone and move the sample out from hot zone.  The typical ramp/cool rate is listed in below:

  Heating Rate:
 10°C/sec (150°C - 250°C);
  7°C/sec (250°C - 350°C);
  4°C/sec (350°C - 500°C);
  3°C/sec (500°C - 550°C);
  2°C/sec (550°C - 650°C);
  1°C/sec (650°C - 800°C);
  0.5°C/sec (800°C - 1000°C);
Cooling Rate:
10°C/sec (950°C - 900°C);
7°C/sec (900°C - 850°C);
4°C/sec (850°C - 750°C);
2°C/sec (750°C - 600°C);
1.5°C/sec (600°C - 500°C);
1°C/sec (500°C - 400°C);
0.5°C/sec (400°C - 300°C);

 
 Optional Parts

  •      •  You may need a right angle valve & bellows to connect a vacuum pump
            ( click the 1st & 2nd pics to order )
  •      •  Anti-Corrosive digital Gauge up to 10E-5 torr is optional for CVD application (Pic 3)
  •      •  You may order multi-channel gas delivery system for DVD or CVD operation ( Pic 4)
                              


Dimensions


   
      
 ( click Pic to see details )


Warranty

One year limited warranty with lifetime support (Consumable parts such as tubes and o-rings are not covered by the warranty)


Laptop, software & WiFi Control(Optional)

  •      •  Brand new laptop with Microsoft Window 10 and Microsoft Office 2013 (30 days free trial) for
             immediate use.
  •      •  Labview Based Temperature Control System (EQ-MTS01) enables user to edit temperature profile,
             manage heat-treatment recipe, record and plot data for MTI furnaces.
  •      •  A wireless remote control provides up to 300 meters operating range.
  •      •  Above features are available upon request at an extra cost (up to $1,000). Please contact us for more
            information.
  •      •  Note: The software is only compatible with MTI’s Yudian Temperature Controller

  •            


Compliance

  •      •  CE Certified
  •      •  All electric components ( >24V) are UL / MET / CSA certified
  •      •  The furnace is ready to pass TUV(UL61010)  or CSA certification at extra cost. 
           ( please click marks below to learn details )
                               


Warning




  •      •  Tube furnaces with quartz tubes are designed for using under vacuum and low pressure
             < 0.2 bars / 3 psi / 0.02 MPa
  •      •  Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the
            pressure to below 3 PSI for safe operation.
     
    Click here to learn the installation of a gas regulator.
  •      •  Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up
             to 1000°C



Operation Video and  Instructions

  
                 


Application Notes

This multi-functional furnace is suitable for the applications in below:

  •      •  RTE:  Crucible loaded with evaporation material is placed in the center of the furnace, move sample
            holder to a downstream position with appropriate temperature where the deposition takes place.
  •      •  HPCVD: Similar setup as RTE, we also introduce reactant gas to mix with evaporation vapor and
            make deposition
  •      •  Horizontal Bridgman Crystal Growth:  Load material and seed into a crucible and place it in the
            center of the furnace. Move the crucible at the desired speed to grow single crystal under suitable
            thermal gradient.
  •      •  If you have any question and suggestion, please contact us before purchasing
  •      •  After CVD, the graphene must be transferred from the metal catalyst to another substrate for most
            applications. By using
    the graphene transfer tape, the residue can be low
  •      •  For Horizontal directional crystalization  (HDC), you may use a gas feedtrough as pic below:

  •