MTI KOREA Battery
Battery R & D
- Coin Cell Preparation
- Cylindrical and Prismatic Cell Preparation
- Pouch Cell Preparation
- Battery Test Equipment
- Consumables for Battery R&D Synthesis
- Thermoelectric Materials
- Zinc-Ion Batteries
Crystal & Material
Crystals Substrates : A-Z
Ceramic Substrates : A-Z
Thin Film on Substrates : A-Z
Metallic substrate :A to Z
Nano Powder&Chemical
Target / Evaporation : A-Z
Thermal Processing
Smart Furnaces
- Muffle Furnaces (400-1800°C)
- Tube Furnaces (1- 7 Zones)
- CVD Furnace System
- Hi-Pressure & H2 Gas Furnaces & Hot Pressing
- RTP Furnaces
- Crystal Growth System
- Dry Ovens / Hot Plates
- Melting and Casting
Furnace Accessories
Plasma System
Plasma Sputtering & Cleaning
PECVD
Microspheres-Nanospheres
Inorganic
Organic
Magnetic
Radioactive
Size Standards
Sample Preparation & Analysis
Cutting / Dicing Saws
Polishing Machines
Lab Press & Rollers
Power & Slurry Mill / Mixer
Film Coating
Desktop Machine-shop
Material Analysis
TGA Analysis
Battery / Capacitor Analyzers
Desk-Top X-Ray Instruments
Digital Microscopes
Other Lab Equipment
Glove Box & Fume Hood
Digital Lab Balances
Plasma/UV-Zone Cleaners
Ultrasonics/Water Circulator
UV Equipment & Adhesives
Lab Ware / Accessory
Sample Handling
Gel Sticky Boxes
Membrane Film Boxes
Round Wafer Carriers
IC Tray & Plastic Boxes
Vacuum Pen & Tweezers
Knowledge Center
등록 제품 : 17개
-조건선택- -조건선택-
상품명 : Compact Auto-Sliding Tube Furnace (50mm OD, 1200°C max.) with Flanges for Fast Heating / Cooling - OTF-1200X-50-SL
상품명 : Horizontal Directed Crystallization (HDC) Tube Furnace, 1100C Max. - OTF-1200X-50-DSL
상품명 : Dual Quartz Tubes (5"/4") & Three Zones CVD Furnace upto 1200C for Graphene Film - OTF-1200X-III-D5-4
상품명 : Rotatable Vacuum Ampule Sealing Device for 20mm O.D Tube - EQ-VTS-1
상품명 : 1200C Dual Zone Split Tube Furnace with Revolving Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
상품명 : 1200C Dual Zone HPCVD Furnace with Sequential & Co-Deposition Source Feeding System (upto 4 Crucibles)- OTF-1200X-II-HPCVD-SE
상품명 : 1200°C Three Zone HPCVD Furnace with Sequential & Co-Deposition Source Feeding System (3 Mobile Crucibles)- OTF-1200X-III-HPCVD-S3
상품명 : 1200°C Max Sliding Tube Furnace (80mm OD) with Flanges for Fast Heating / Cooling - OTF-1200X-80-SL
상품명 : 1200°C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD
상품명 : Two Zone IR Heated RTP Tube Furnace (4'' ID ) with Slide-able Sample Holder -OTF-1200X-IR-IISL
상품명 : Three-Zone Dual-Tube (11"/10") CVD Furnace (1200°C Max.) with Tube Extractor for Large-Area Graphene Growth - GSL-1100X-III-D11
상품명 : Dual Tube (100/80 mm) - CVD Sliding Furnace and 4 Channel Gas & Vacuum System - OTF-1200X-4-C4-SL-UL
