YAlO3 is excellent substrate for HTS film and II-V nitride ,
as well as many oxide films due to its chemcial stability and lattice matching.
Structure Lattice (A) Melting
Point
Density
g/cc
Dielectric
Constant
Thermo-Expans
x10-6/K
Max. Xtl
Size
Orthor. a=5.3286(4)
b=7.3706(5)
c=5.1796(3)
1870 oC 4.88 16-20 2-10 30d x 50mm
○   XRD diffraction ange :  20°54' <110> and (41°44') <220>
○    For more YAlO3 data,please click here.
 

YAlO3 undoped 

 
 
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