VTC-2RF is a compact 2“ single head RF Plasma magnetron sputtering system coating non-metallic, mianly oxide thin fim It integrates all components into one floor stand cabinet,including RF 300 power source, quartz vacuum chamber , vacuum pump, recirculating water chiller and film thickness monitor etc。
It is an excellent and cost effective coater for coaing thin film of non-conductive material in R & D
SPECIFICATIONS
Input Power
•220 VAC 50/60 Hz, single phase •800 W (including pump) •If operating at 110V, one 1000W ttransformer will be required.
Clcik picture below to order
•One 2" Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp ( click Pic-left to see detailed specs ) •One shutter is built on the flange ( manually operated ， PIC.left3) •Target size requirement : 2" diameter x 1/4"thicknes Max. •One Al2O3 ceramic targets are included for demo testing •One 16 ml/min digitally controlled recirculating water chiller is installed on bottom cabinet for cooling magnetron sputtering heads ( click Pic right -2) for detail specs) •1" sputtering head is replaceable and optional at extra cost ( click Pic right to order )
Vacuum Chamber
•Vacuum Chamber : 160 mm OD x 150 mm ID x 250 mm Height. made of high purity quartz. •Sealing Flange : 165 mm Dia. made of Aluminium with high temperature silicone O-ring •Stailess steel mesh cover is included for 100% shielding RF radiation from chamber •Vacuum level : 10-3 Torr with included dual stage mechnical pump and 10-5 torr with optional turbo pump •Optional : Stainless steel chamber is available at extra cost.
Sample Holder
•Sample holder is rotable and heatable made of ceramic heater with stainless steel cover. •sample holder size : 50 mm dia. for. 2" wafer max •Rotation speed is adjustable : 1 - 10 rpm for uniform coating •The holder temperature is adjustable from RT to 700°C Max with accuracy +/- 1.0 °C via digital temperature controller.
Gas Flow Control
•One 0 -- 1000 ml/min flow-meter is built in for consistent gas purging •Precision MFC is available upon request on extra cost
•One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å •LED Display Unit outside chamber can :
○ Input material to be coated according to data base included ○ Display total thickness coated and coating speed
•5 pcs quartz sensors (consumable) are included •Water cooling is required
Overall Dimensions
（click the picture to see details )
Net Weight
70 kg
Warranty & Compliance
•One years limited warranty with lifetime support •CE certified
Operation Instruction
Application Note
•This compact 2" RF coater is designed for coating oxide thin film on oxide single crystal substrate, which usually don't need high vacuum set-up. •In order to remove oxygen from the chamber, suggest you use 5% Hytrogen + 95 % Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm •Please use > 5N purity Argon gas for plasma sputtering.
Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O dependedon supplier.
Strongly suggest you use gas purification device listed below to purify gas before filling in : ( click pic to order ) •We can install a DC power supply into this unit to allow coating both non-conductive and metallic thin films upon request •MTI supply single crystal substrate from A to Z ( click picture below-right to order )
