VTC-1RF is a desktop 1“ single head RF Plasma magnetron sputtering system for coating non-metallic, mainly for oxide thin fim It is a cost effective coater for researching new generation non-conductive thin film.
SPECIFICATIONS
Input Power
•220 VAC 50/60 Hz, single phase •800 W (including pump) •If operating at 110V, one 1000W ttransformer will be required. Clcik picture below to order
Source Power
•One 13.5 MHz, 100W RF Generator with manual matching is included and connected to 1" sputtering head. •300W RF Generator with auto matching is optional at extra cost. ( click pic below to see detailed specs ) •Note : Manual matched RF source has lower cost, but needs time to adjust plasma glowing for each tyoe of target. Auto-matched RF saves time, but more expensive
(100W RF-Manual matching)
(300RF-Auto-matching)
Magnetron Sputtering Head
•One 1" Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp ( click Pic-left to see detailed specs ) •One shutter is built on the flange ( manually operated, PIC.left3 ) •Target size requirement : 1" diameter x 1/8" thicknes Max. •One Al2O3 ceramic targets are included for demo testing •One 10 ml/min digitally controlled recirculating water chiller is included for cooling sputtering heads ( click Pic right -2 for detail specs)
Vacuum Chamber
•Vacuum Chamber : 160 mm OD x 150 mm ID x 250 mm Height. made of high purity quartz. •Sealing Flange : 165 mm Dia. made of Aluminium with high temperature silicone O-ring •Stailess steel mesh cover is included for 100% shielding RF radiation from chamber •Max. vacuum level : 10-6 torr with chamber baking
Sample Holder
•Sample holder is rotable and heatable made of ceramic heater with stainless steel cover. •sample holder size : 50 mm dia. for. 2" wafer max •Rotation speed is adjustable : 1 - 10 rpm for uniform coating •The holder temperature is adjustable from RT to 700°C Max with accuracy +/- 1.0 °C via digital temperature controller.
Thickness Monitor
•One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å •LED Display Unit outside chamber can :
○ Input material to be coated according to data base included ○ Display total thickness coated and coating speed
•5 pcs quartz sensors (consumable) are included •Water cooling is required
Vacuum Pump ( Optional )
•KF25 Vacuum port is built in for connecting to a Vacuum Pump , which is not included. •Please click picture below to choose mechanical pump or turbo pump •Vacuum level : 10-3 Torr with included dual stage mechnical pump and 10-5 torr with optional turbo pump
Net Weight
50 kg
Warranty & Compliance
•One years limited warranty with lifetime support •CE certified
Operation Instruction
Application Note
•This compact 1" RF coater is designed for coating oxide thin film on oxide single crystal substrate, which usually don't need high vacuum set-up. •In order to remove oxygen from the chamber, suggest you use 5% Hytrogen + 95 % Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm •Please use > 5N purity Argon gas for plasma sputtering.
Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O dependedon supplier.
Strongly suggest you use gas purification device listed below to purify gas before filling in : ( click pic to order ) •MTI supply single crystal substrate from A to Z ( click picture below-right to order )
