GSL1100X-PJF-H combines an atmospheric plasma beam, a two dimensions automatic working stage, and a heating plate together, which allows the plasma beam to scan the sample surface according to the program setting and surface coating or treatment consistency and uniformity. The system consists of an RF generator, flexible gas delivery pipe, plasma beam head, the X-Y working stage, vacuum chuck sample holder, a programmable control box, heat plates, and a temperature control box. The plasma beam can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics, etc, It also makes plasma-enhanced CVD film on the substrate via a mixture of chemical gas under atmospheric pressure.
SPECIFICATIONS
Input Power for Plasma
208 V - 240VAC, 50/60 Hz, < 1000W
RF Generator
Output Frequency: 20-23 kHz, 25KV (click picture below - left to see detailed specs) Plasma Beam Head: Round head: 10-12mm
Input Gas Pressure and Working Gases
40 PSI min. (0.055 Mpa)
Air, N2, Ar, He, or any mixed gases (no flammable and explosive gases)
