EQ-PCE-3 ( upgraded from EQ-PDC-32G-LD ) is a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door. which is designed forcleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily. The rate of organic removal is about 10 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality. If you do not have any experience for plasma surface cleaning, please refer to the articles as the follows:
• McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
• Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
• Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.
SPECIFICATIONS
Features
• Cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily.
• Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
• Hinged type door for easy sample loading.
• 3" Diameter Quartz Chamber excellent for cleaning 2" wafer with option Quartz Boat
• Removable Quartz tube inside Quartz Chamber easy to clean and replacement.
RF Power
RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels:
Low Setting
680V
10 mA
7 W
Medium Setting
700V
15 mA
11 W
High Setting
720V
25 mA
18 W
Plasma Chamber
• 3" diameter x 6.5" length quartz chamber
• 700 mL capacity
• High purity quartz has longer service life than glass.
• Many inert gases can be chosen for plasma cleaning, such as N2, Ar, Air and Mixed gas depended on what kind material will be treated. ( Please select the two-channel gas mixer from model selection)
• <5% H2 mixed inert gas can be used
• No flammable gas shall be used for the plasma cleaner.
• Combinations of PCE-3 plasma cleaner withTwo Channel Gas Mixer will be a solution for introducing up to two (2) process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture below for Two Channel Gas Mixer.
• You may orderquartz wafercarrier to clean 2" wafer
Warranty
One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )