Thermal Oxide Wafer 2" Dia.

Thermal Oxide Wafer, 30 nm SiO2 Layer on Si (100), 2" dia x 0.50 mm t, N type, As-doped, 1 side polished, R:

Thermal Oxide Wafer, 30 nm SiO2 Layer on Si (100), 2" dia x 0.50 mm t, N type, As-doped, 1 side polished, R:<0.005 ohm.cm

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Product Name Thermal Oxide Wafer, 30 nm SiO2 Layer on Si (100), 2" dia x 0.50 mm t, N type, As-doped, 1 side polished, R:<0.005 ohm.cm
Sale Price Call for Price
Product Code Fm30SOonSIAsa50D05C1R0005US
Quantity 수량증가수량감소
상품 옵션
 

     Thermal oxide Layer

  •           •  Research Grade, about 80 % useful  area
  •           •  SiO2 layer on 2" Silicon wafer
  •           •  Oxide layer thickness: 30 nm ( 300A) +/-10%
  •           •  Refractive index: 1.455

     Silicon Wafer Specifications:

  •           •  Conductive type:  N type/ As- doped
  •           •  Resistivity:   <0.005 ohm-cm  (If you would like to measure the
                                     resistivity accurately,

                                     please order our Portable 4 Probe Resistivity Testing Instrument.) 
  •           •  Size:            50.8 diameter +/- 0.5 mm x 0.50 +/- 0.025 mm
  •           •  Orientation:  (100) +/- 1o
  •           •  Polish:          one side polished
  •           •  Surface roughness, Ra: < 5A (RMS)