Square Al2O3(11-02) substrate

Al2O3 - Sapphire Wafer, , 10x5x0.5mm, 1 sp - ALR100505S1

Al2O3 - Sapphire Wafer, <11-02>, 10x5x0.5mm, 1 sp - ALR100505S1

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Product Name Al2O3 - Sapphire Wafer, <11-02>, 10x5x0.5mm, 1 sp - ALR100505S1
Sale Price Call for Price
Product Code ALR100505S1
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Fearures:

  •      •  Sapphire substrate is the popular substrates for III-V nitrides, superconductor and magnetic epi film
            due to less mis-matched lattice and stable chemical and physical properties. 
  •      •  Wafer size: 10 mm x 5 mm  x 0.5 mm thick
  •      •  Orientation tolerance: +/-0.5 Deg.  R plane orientation 
  •      •  Polished surfacesubstrate surface is EPI polished via a special CMP procedure with Ra < 5 A
  •      •  1 side polished 
  •      •  Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container.
  •      •  Precaution: R plane sapphire wafer is easy to cleave compared with C plane's. Please handle it with a care 

Typical Properties:

  •      •  Crystal Structure: Hexagonal. a=4.758 Angstroms c=12.99 Angstroms
  •      •  Melting Point: 2040 degree C
  •      •  Density: 3.97 gram/cm2 
  •      •  Growth Technique: CZ
  •      •  Crystal Purity:  >99.99%
  •      •  Hardness: 9 ( mohs)
  •      •  Thermal Expansion: 7.5x10-6 (/ oC)
  •      •  Thermal Conductivity: 46.06 @ 0 oC, 25.12 @ 100 oC, 12.56 @ 400 oC ( W/(m.K) ) 
  •      •  Dielectric Constant: ~ 9.4 @300K  at A axis ~ 11.58@ 300K at C axis
  •      •  Loss Tangent at 10 GHz: < 2x10-5  at A axis <5 x10-5  at C axis

 Please click here for detail data