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InAlAs on InP
2" dia. InAlAs EPI Film on InP (SI) (100) 2" dia x0.35mm,1sp , EPI layer :300nm thick, undoped In0.52Al0.48As
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2" dia. wafer InAlAs EPI on InP (Semi-insulating)(100) by MOCVD deposition
- Doped with Fe, Semi-Insulating
- Resistivity
- > 1 x 107 ohm.cm
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•Undoped In0.52Al0.48As, Thickness : 300 nm
•One side polished
•Roughness N/A
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Working days : Monday to Saturday
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