Boron nitride is a chemical compound with chemical formula BN, consisting of equal numbers of boron and nitrogen atoms. BN is isoelectronic to a similarly structured carbon lattice and thus exists in various crystalline forms. The Cubic (sphalerite structure) bariety analogous to diamond is called c-BN. Its hardness is inferior only to diamond, but its thermal and chemical stability is superior. Low-pressure deposition of thin films of boron nitride are grown on Si (100) wafers for this product. •BN Film coated by sputtering method •BN Thickness: 24 nm +/- 10%
Silicon Wafer Specifications
Conductive type
Sin- type
Resistivity
1- 10 ohm-cm
Size
4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mmth
Orientation
(100) +/- 0.5o
Polish
One sides polished
Surface roughness
Prime
Packing
Vacuum packed on a 4" single wafer carrier box
Optional : you may need tool below to handle the wafer
